Abstract:To address the data imbalance caused by the limited number of samples in certain wafer defect pattern categories, a defect image augmentation method based on an improved CycleGAN framework was proposed. The generator incorporates the ULSAM attention mechanism to enhance cross-channel feature extraction capability. The discriminator is structurally optimized to reduce critical information loss, and PReLU activation is employed to improve gradient stability and accelerate model convergence. Experimental results show that the proposed method increases the SSIM by 0.2034 and reduces the FID by 84.95 for the Donut category. Classification models trained on datasets before and after augmentation achieve accuracy improvements of 1.1% and 7.2% for the Donut and Random categories, respectively. The method enhances the generation quality of minority-class defect images and improves the classification accuracy of wafer defect detection models under imbalanced data conditions.