基于PEM的反应磁控溅射镀膜机参数监控系统

Plasma Emission Monitoring System of Reactive Magnetron Sputtering

摘要:

实时在线监测磁控溅射反应气体的参数可有效保证镀膜质量;针对反应磁控溅射离子镀膜机反应气体的功能需求,分析了反应气体的控制原理,基于PEM方法提出了控制器方案和反应气体的参数监控方案,分析了监控系统的功能需求,自定义了串口通信协议,基于LabVIEW和串口设计了反应气体的参数监控系统系统,并与设计的控制器用于镀膜工艺试验;试验结果表明,基于PEM方法设计的反应气体参数监控系统功能正确,可为控制器和镀膜机提供参数调控依据,为提高硬质镀膜质量提供了一套有效的监控方法。

Abstract:

Online monitor the gas control parameter is very important for film deposition and quality in RMS (Reactive Magnetron Sputtering) process. According to the RMS monitoring requirement, the reactive gas control method was analyzed, the gas flow controller based on PEM (Plasma Emission Monitoring) method and reactive parameters monitoring plan were proposed. The functions of monitoring system were analyzed, a private serial communication protocol for parameter transmitting between controller and PC was proposed, on this basis, monitoring system was designed with LabVIEW through serial communication; the functions were taken experiment in the RMS machine with self-made gas controller. The result indicated that the controller based on PEM could control the gas flow according to the requirement of film process and the monitoring functions were correct, which could provide parameter adjustment for gas controller and light intensity. The monitoring system provides a valid method to improve the film quality.